Seongnam, South Korea

Moo-Young Lee

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignees: Rohm & Haas Electronic Materials LLC, Rohm and Haas Electronic Materials Korea Ltd.. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Moo-Young Lee. Retrieved from https://idiyas.com/inventor/moo-young-lee-nwl70vuy

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

 

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Moo-Young Lee: Innovator in Display Device Manufacturing

Introduction

Moo-Young Lee is a notable inventor based in Seongnam-si, South Korea. He has made significant contributions to the field of display device manufacturing. His innovative approach has led to the development of a unique method that enhances the efficiency and quality of display devices.

Latest Patents

Moo-Young Lee holds a patent for a display device manufacturing method that utilizes a sacrificial layer interposed between a carrier and a display device substrate. This innovative technique aims to improve the manufacturing process of display devices, making it more effective and reliable. He has 1 patent to his name.

Career Highlights

Throughout his career, Moo-Young Lee has worked with prominent companies in the electronics materials sector. He has been associated with Rohm & Haas Electronic Materials LLC and Rohm and Haas Electronic Materials Korea Ltd. His experience in these organizations has contributed to his expertise in display technology.

Collaborations

Moo-Young Lee has collaborated with talented individuals in his field, including Young Seok Kim and Yerang Kang. These partnerships have fostered innovation and have been instrumental in advancing their shared goals in display technology.

Conclusion

Moo-Young Lee's contributions to display device manufacturing highlight his innovative spirit and dedication to advancing technology. His work continues to influence the industry and inspire future developments in display technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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