Monique Ben-Dor

Title: Monique Ben-Dor: Innovator in Semiconductor Technology

Introduction

Monique Ben-Dor is a prominent inventor based in Palo Alto, CA, known for her contributions to semiconductor technology. She holds a total of 3 patents that focus on advanced methods for enhancing semiconductor manufacturing processes. Her innovative approaches have significantly impacted the efficiency and effectiveness of these technologies.

Latest Patents

Monique's latest patents include a method of depositing a silicon-containing layer on a semiconductor substrate and a plasma cleaning method for removing deposits in a CVD chamber. The plasma cleaning method involves introducing a cleaning gas comprising a fluorine-based gas into the chamber. A plasma is formed by exposing the cleaning gas to an inductive field generated by resonating a radio frequency current in an RF antenna coil. This method allows for in-situ cleaning of the chamber at high rates, effectively reducing equipment downtime. Additionally, her inductively coupled plasma CVD method focuses on depositing a dielectric film on a substrate in a process chamber, achieving gap filling between electrically conductive lines and producing films with improved physical characteristics.

Career Highlights

Throughout her career, Monique has worked with notable companies such as Lam Research Corporation and Alza Corporation. Her experience in these organizations has allowed her to develop and refine her innovative techniques in semiconductor processing.

Collaborations

Monique has collaborated with esteemed colleagues, including Paul K. Shufflebotham and Brian K. McMillin, contributing to advancements in the field of semiconductor technology.

Conclusion

Monique Ben-Dor's work in semiconductor technology exemplifies her commitment to innovation and excellence. Her patents and career achievements highlight her significant contributions to the industry.