This inventor holds 1 USPTO granted patent. Top assignee: Carl Zeiss Sms Ltd.. Active years: 2012.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2012
Title: Monika Frey: Innovator in Lithography Mask Measurement
Introduction
Monika Frey is a prominent inventor based in Steinheim, Germany. She has made significant contributions to the field of lithography, particularly in the measurement of lithography masks. Her innovative work has led to the development of a device that enhances the precision and efficiency of this critical process in semiconductor manufacturing.
Latest Patents
Monika Frey holds 1 patent for her invention titled "Device and method for measuring lithography masks." This device is designed to provide accurate measurements of lithography masks, which are essential for the production of integrated circuits. The invention reflects her commitment to advancing technology in the semiconductor industry.
Career Highlights
Throughout her career, Monika has been associated with Carl Zeiss SMS Ltd., a company renowned for its expertise in optical systems and measurement technology. Her role at the company has allowed her to work on cutting-edge projects that push the boundaries of what is possible in lithography.
Collaborations
Monika has collaborated with notable colleagues, including Dietmar Neugebauer and Stefan Otto. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.
Conclusion
Monika Frey's contributions to the field of lithography mask measurement exemplify her dedication to innovation and technology. Her work not only enhances the efficiency of semiconductor manufacturing but also showcases the importance of collaboration in driving advancements in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile