Dresden, Germany

Mohammed Radwan

USPTO Granted Patents = 3 

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2013-2015

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3 patents (USPTO):Explore Patents

Title: Mohammed Radwan: Innovator in Plasma Etching Technology

Introduction

Mohammed Radwan is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of plasma etching technology, holding a total of 3 patents. His work focuses on improving the efficiency and effectiveness of plasma-assisted etch processes, which are crucial in the manufacturing of microstructure devices.

Latest Patents

One of Mohammed Radwan's latest patents is a technique for reducing plasma-induced etch damage during the formation of vias in interlayer dielectrics by modified RF power ramp-up. This innovative approach addresses the challenges associated with plasma-assisted etch processes for patterning complex metallization systems. By utilizing a superior ramp-up system for high frequency and low frequency power, the probability of creating plasma-induced damage, such as arcing, can be significantly reduced or eliminated. The method involves increasing the high frequency power at a higher rate compared to the low frequency power component, with a time delay ensuring that the high frequency component reaches its target power level before the low frequency component.

Career Highlights

Mohammed Radwan is currently employed at Globalfoundries Inc., where he continues to develop and refine his innovative techniques in plasma etching. His expertise in this area has positioned him as a valuable asset to the company and the industry at large.

Collaborations

Throughout his career, Mohammed has collaborated with esteemed colleagues, including Matthias Zinke and Johann Steinmetz. These partnerships have fostered a collaborative environment that enhances innovation and drives advancements in technology.

Conclusion

In summary, Mohammed Radwan is a distinguished inventor whose work in plasma etching technology has led to significant advancements in the field. His innovative techniques and collaborations with fellow experts continue to shape the future of microstructure device manufacturing.

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