Campbell, CA, United States of America

Mohammed N Darwish

This inventor holds 1 USPTO granted patent. Top assignee: Maxpower Semiconductor Inc.. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mohammed N Darwish. Retrieved from https://idiyas.com/inventor/mohammed-n-darwish

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2011

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Mohammed N Darwish: Innovator in Semiconductor Technology

Introduction

Mohammed N Darwish is a notable inventor based in Campbell, California. He has made significant contributions to the field of semiconductor technology, particularly with his innovative patent related to devices containing permanent charge.

Latest Patents

Darwish holds a patent for an edge termination structure that includes a final dielectric trench containing permanent charge. This trench is surrounded by first conductivity type semiconductor material, which is doped by lateral outdiffusion from the trenches. Additionally, this structure is laterally surrounded by second conductivity type semiconductor material. His inventive work has the potential to enhance the performance and reliability of semiconductor devices.

Career Highlights

Currently, Mohammed N Darwish is employed at Maxpower Semiconductor Inc., where he continues to push the boundaries of semiconductor technology. His expertise and innovative mindset have made him a valuable asset to the company.

Collaborations

Darwish collaborates with talented professionals in his field, including his coworker Amit Paul. Together, they work on advancing semiconductor technologies and exploring new possibilities in the industry.

Conclusion

In summary, Mohammed N Darwish is a distinguished inventor whose work in semiconductor technology has led to valuable innovations. His contributions are shaping the future of the industry and enhancing the capabilities of electronic devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…