Mohammed Haroon Alvi

Title: Innovations of Mohammed Haroon Alvi

Introduction

Mohammed Haroon Alvi is a notable inventor based in Fremont, California. He has made significant contributions to the field of semiconductor technology, particularly in the area of thin-film processes. With a total of two patents to his name, Alvi's work is recognized for its innovative approaches to patterning techniques.

Latest Patents

Alvi's latest patents focus on integrated dry processes for patterning radiation photoresist. These methods are designed for making thin films on semiconductor substrates that can be patterned using extreme ultraviolet (EUV) lithography. The process involves depositing an organometallic polymer-like material onto the semiconductor substrate, exposing it to EUV to form a pattern, and then developing that pattern for transfer to underlying layers. The depositing operations can be performed using techniques such as chemical vapor deposition (CVD) and atomic layer deposition (ALD), including variations that separate metal precursors and counter-reactants in time or space.

Career Highlights

Alvi is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has allowed him to push the boundaries of semiconductor manufacturing processes. His innovative techniques have the potential to enhance the efficiency and effectiveness of semiconductor production.

Collaborations

Some of Alvi's notable coworkers include Jengyi Yu and Samantha S H Tan. Their collaborative efforts contribute to the advancement of technology in the semiconductor field.

Conclusion

Mohammed Haroon Alvi's contributions to semiconductor technology through his patents and work at Lam Research Corporation highlight his role as an influential inventor. His innovative methods for patterning thin films are paving the way for advancements in the industry.