Bengaluru, India

Mohammed Dilkash Azam

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mohammed Dilkash Azam. Retrieved from https://idiyas.com/inventor/mohammed-dilkash-azam

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Mohammed Dilkash Azam: Innovator in Substrate Measurement Technology

Introduction

Mohammed Dilkash Azam is a notable inventor based in Bengaluru, India. He has made significant contributions to the field of substrate measurement technology. His innovative approach has led to the development of a unique patent that addresses inherent substrate distortion.

Latest Patents

Azam holds a patent titled "Measurement of Inherent Substrate Distortion." This method involves obtaining first data indicative of a measured profile of a substrate. It further includes obtaining second data indicative of a profile of a reference substrate. The process determines a corrected substrate profile based on the first and second data. Finally, it performs a corrective action based on the corrected substrate profile. He has 1 patent to his name.

Career Highlights

Currently, Mohammed Dilkash Azam works at Applied Materials, Inc., a leading company in the field of materials engineering. His role involves applying his expertise to enhance substrate measurement techniques. His work has been instrumental in advancing the technology used in various applications.

Collaborations

Some of his notable coworkers include Piyush Kumar Pandey and Prabal Sen. Their collaboration has fostered an environment of innovation and creativity within the team.

Conclusion

Mohammed Dilkash Azam is a distinguished inventor whose work in substrate measurement technology has made a significant impact. His patent reflects his commitment to innovation and excellence in his field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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