Chandler, AZ, United States of America

Mohamed Boumerzoug

This inventor holds 3 USPTO granted patents. Top assignee: Nanoclean Technologies, Inc.. Active years: 2004-2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mohamed Boumerzoug. Retrieved from https://idiyas.com/inventor/mohamed-boumerzoug

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 33.3

Average Co-Inventor Count = 2.6

ph-index = 2

Forward Citations = 27(Granted Patents)


Company Filing History:


Years Active: 2004-2006

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3 patents (USPTO):Explore Patents

Title: Innovations by Inventor Mohamed Boumerzoug

Introduction

Mohamed Boumerzoug is an accomplished inventor based in Chandler, AZ (US). He has made significant contributions to the field of technology, particularly in methods for cleaning and residue removal in semiconductor manufacturing processes. With a total of 3 patents, his work has garnered attention for its innovative approaches to solving complex problems in the industry.

Latest Patents

One of his latest patents is titled "Methods for residue removal and corrosion prevention in a post-metal etch process." This invention involves a method of plasma-assisted CO cleaning for the dry removal of residual photoresist and sidewall polymer using an etch gas mixture that includes fluorine-containing gas, oxygen, and hydrogen. The process effectively removes polymer residues from metal layers and inhibits chlorine-based corrosion while being selective to materials such as Ti, TiN, Al, and SiO. This invention is particularly beneficial for cleaning post-metal etch polymer residues from the top and sidewalls of metal lines.

Another notable patent is "Methods for resist stripping and cleaning surfaces substantially free of contaminants." This invention describes a plasma-assisted cryogenic cleaner and a method for cleaning surfaces that must be free of contaminants. It features a resiliently mounted nozzle that sprays a cryogenic cleaning medium onto the surface. The cleaning process involves applying a mixture of gases to remove the photoresist layer and alter the composition of residues, making them soluble in water. The cryogenic and plasma processes can be performed either sequentially or simultaneously, enhancing the efficiency of the cleaning operation.

Career Highlights

Mohamed Boumerzoug is currently employed at Nanoclean Technologies, Inc., where he continues to innovate and develop new technologies. His work has been instrumental in advancing cleaning processes in the semiconductor industry, contributing to improved manufacturing efficiency and product quality.

Collaborations

He has collaborated with notable coworkers such as Adel George Tannous and Khalid Makhamreh, further enhancing the innovative environment at Nanoclean Technologies, Inc.

Conclusion

In summary, Mohamed Boumerzoug is a prominent inventor whose work in cleaning technologies has made a significant impact in the semiconductor industry. His innovative patents reflect his commitment to advancing technology and improving manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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