The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 2006
Filed:
Jan. 28, 2005
Applicants:
Mohamed Boumerzoug, Chandler, AZ (US);
Adel George Tannous, Santa Clara, CA (US);
Inventors:
Mohamed Boumerzoug, Chandler, AZ (US);
Adel George Tannous, Santa Clara, CA (US);
Assignee:
Nanoclean Technologies, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of plasma assisted COcleaning for dry removal of residual photoresist and sidewall polymer with an etch gas mixture comprising fluorine containing gas, oxygen and hydrogen in Nor HO. The process removes polymer residues present on a metal layer on a substrate and on the sidewalls of metal lines and inhibits chlorine-based corrosion while being very selective to exposed Ti, TiN, Al and SiO. The invention is particularly suited for removing post metal etch polymer residue from top and sidewall of metal lines.