Mie, Japan

Miyata Koji


 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: Innovations of Miyata Koji in Semiconductor Fabrication

Introduction

Miyata Koji is a notable inventor based in Mie, Japan, recognized for his contributions to semiconductor technology. He has developed a unique process that addresses challenges in the fabrication of semiconductor devices, particularly those involving copper wiring.

Latest Patents

Miyata holds 1 patent for his innovative process titled "Process for fabricating a semiconductor device having recess portion." This patent outlines a method for creating a recess in an insulating film that covers copper or copper alloy wiring. The process includes a plasma treatment using gases such as hydrogen and nitrogen, which enhances the cleaning of the via hole's bottom portion, thereby improving the overall quality of the semiconductor device.

Career Highlights

Miyata Koji is currently employed at Sony Corporation, where he applies his expertise in semiconductor fabrication. His work has significantly contributed to advancements in the field, particularly in improving the reliability and efficiency of semiconductor devices.

Collaborations

Miyata has collaborated with notable colleagues, including Mitsuru Taguchi and Shingo Kadomura, to further enhance the development of semiconductor technologies.

Conclusion

Miyata Koji's innovative approach to semiconductor fabrication exemplifies the importance of addressing technical challenges in the industry. His contributions continue to influence advancements in semiconductor technology.

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