This inventor holds 1 USPTO granted patent. Top assignee: Hitachi, Ltd.. Active years: 1984.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1984
Title: Mitsuyuki Oda: Innovator in Ultrasonic Flaw Inspection
Introduction
Mitsuyuki Oda is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of ultrasonic flaw inspection, showcasing his expertise through innovative patents. His work focuses on enhancing the accuracy and efficiency of flaw detection in various materials.
Latest Patents
Mitsuyuki Oda holds a patent for an "Ultrasonic method of determining nature of flaws by incremental scanning." This invention involves emitting ultrasonic waves to a subject via a probe and receiving ultrasonic echoes from flaws within the subject. By comparing changes in the propagation distances of these echoes before and after moving the probe, Oda's method allows for precise determination of flaw sizes. The technique ensures that echoes are identified as originating from the same flaw if the change width falls within a predetermined value, which is influenced by the angle of incidence of the ultrasonic wave.
Career Highlights
Oda is associated with Hitachi, Ltd., a leading technology company known for its advancements in various sectors. His work at Hitachi has allowed him to apply his innovative ideas in practical settings, contributing to the company's reputation for excellence in technology and engineering.
Collaborations
Mitsuyuki Oda has collaborated with notable colleagues, including Izumi Kobayashi and Yohsuke Ojiri. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and enhances the development of innovative solutions in ultrasonic inspection technology.
Conclusion
Mitsuyuki Oda's contributions to ultrasonic flaw inspection demonstrate his commitment to innovation and excellence in engineering. His patented methods are paving the way for advancements in flaw detection, ensuring greater safety and reliability in various applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
