Gifu, Japan

Mitsuyuki Kobayashi

This inventor holds 1 USPTO granted patent. Top assignees: Sanyo Electric Co., Ltd., Sanyo Semiconductor Co., Ltd., Sanyo Semiconductor Manufacturing Co., Ltd.. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mitsuyuki Kobayashi. Retrieved from https://idiyas.com/inventor/mitsuyuki-kobayashi-xzfprv5v

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Mitsuyuki Kobayashi: Semiconductor Device Inventor

Introduction

Mitsuyuki Kobayashi is an inventor associated with Gifu, Japan. His patent work includes a semiconductor device designed to reduce resistance in a discrete semiconductor chip.

Latest Patents

Kobayashi’s patent, “Semiconductor device,” addresses resistance caused by horizontal current flow through a semiconductor substrate. The design places first and second electrodes connected to an element region above the substrate’s first surface and adds a thick, low-resistance metal layer above its second surface. The layer is corrosion- and oxidation-resistant, and its thickness can be selected to lower device resistance while limiting added cost. Using gold for the layer can also help prevent discoloration over time. Kobayashi is credited with 1 patent.

Career Highlights

Kobayashi’s listed company affiliations include Sanyo Semiconductor Co., Ltd. and Sanyo Semiconductor Manufacturing Co., Ltd. His patent reflects work on semiconductor device structure and electrical resistance reduction.

Collaborations

Kobayashi’s listed coworker is Tetsuya Yoshida.

Conclusion

Mitsuyuki Kobayashi’s patent describes a semiconductor device that uses a low-resistance metal layer to reduce resistance while addressing durability and cost considerations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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