Tokyo, Japan

Mitsutoshi Fukada

This inventor holds 2 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 2014-2026.


% Patents Active = 50.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2014-2026

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2 patents (USPTO):Explore Patents

Title: Innovations by Mitsutoshi Fukada

Introduction

Mitsutoshi Fukada is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of engineering, particularly in the development of advanced valve technologies. His innovative designs have the potential to enhance various industrial processes.

Latest Patents

Mitsutoshi Fukada holds a patent for a shuttered gate valve. This invention includes embodiments of gate valves and methods of using them. The gate valve is designed for use in a process chamber and features a body with an opening that extends from one surface to the opposing surface. It includes a pocket that allows a gate to move between a closed position, sealing the opening, and an open position, where the gate is fully contained within the pocket. Additionally, the valve incorporates a shutter that selectively seals the pocket when the gate is in the open position. This design may also include heaters coupled to the body or the shutter.

Career Highlights

Mitsutoshi Fukada is associated with Applied Materials, Inc., a leading company in the field of materials engineering. His work at this organization has allowed him to contribute to cutting-edge technologies that are essential for various manufacturing processes.

Collaborations

Mitsutoshi Fukada collaborates with Shin Kitamura, a fellow innovator in the field. Their partnership exemplifies the importance of teamwork in driving technological advancements.

Conclusion

Mitsutoshi Fukada's contributions to valve technology through his patent for a shuttered gate valve highlight his innovative spirit and dedication to engineering excellence. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
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