The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 2026
Filed:
Jan. 31, 2023
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventor:
Mitsutoshi Fukada, Tokyo, JP;
Assignee:
Applied Materials Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10P 72/72 (2026.01); H10P 72/76 (2026.01); H01J 37/02 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H10P 72/722 (2026.01); H10P 72/7612 (2026.01); H10P 72/7614 (2026.01); H10P 72/7624 (2026.01); H01J 37/32715 (2013.01); H01J 37/32724 (2013.01); H01J 2237/002 (2013.01); H01J 2237/006 (2013.01); H01J 2237/0203 (2013.01); H01J 2237/026 (2013.01); H01J 2237/16 (2013.01); H01J 2237/2007 (2013.01); H01J 2237/32 (2013.01); Y10T 279/23 (2015.01);
Abstract
Embodiments of substrate supports for use in process chambers are provided herein. In some embodiments, a substrate support includes: an electrostatic chuck (ESC) having an upper surface and a plurality of mesas extending upward from the upper surface and a plurality of trenches extending downward from the upper surface and into the ESC, wherein the ESC includes a plurality of backside gas openings extending through the ESC and terminating within at least some of the plurality of trenches; and one or more chucking electrodes disposed in the ESC.