Mitsuru Konno

Title: Mitsuru Konno: Innovator in Electron Microscopy

Introduction

Mitsuru Konno is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of electron microscopy, holding 2 patents that enhance the capabilities of scanning electron microscopes and focused ion beam systems.

Latest Patents

One of his latest patents is for a scanning electron microscope that addresses the limitations of conventional models. This invention includes an electron source that generates an electron beam, a deflector for scanning the sample, an objective lens for focusing the beam, and a detector for capturing both elastically and inelastically scattered electrons. The design allows for improved magnification calibration and the observation of thin crystal samples under high-resolution conditions.

Another notable patent is for a focused ion beam system that can acquire surface structure, internal structure, and composition information simultaneously from the same field of view. This system employs a secondary electron detector, a transmission electron detector, and an energy dispersive X-ray spectroscope. It also includes a method for sample preparation and observation that accurately sets processing positions based on structural and compositional information.

Career Highlights

Mitsuru Konno is currently employed at Hitachi High-Technologies Corporation, where he continues to innovate in the field of electron microscopy. His work has significantly advanced the capabilities of imaging and analysis in various scientific applications.

Collaborations

He has collaborated with notable coworkers such as Yuya Suzuki and Takeo Kamino, contributing to the development of advanced technologies in their field.

Conclusion

Mitsuru Konno's contributions to electron microscopy through his innovative patents have made a lasting impact on the field. His work continues to push the boundaries of what is possible in scientific imaging and analysis.