Mitsuru Asano

Title: Innovations of Mitsuru Asano

Introduction

Mitsuru Asano is a notable inventor based in Kyoto, Japan. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative spirit and technical expertise.

Latest Patents

Asano's latest patents focus on a development processing device. This device features a slit nozzle that is moved by a nozzle lifting/lowering mechanism and a nozzle sliding mechanism. It operates relative to substrates held in a substantially horizontal attitude by spin chucks. The development liquid is discharged on each substrate from a discharge port of the slit nozzle, allowing for effective development processing. After the development liquid is discharged, the slit nozzle is moved to a waiting position, excluding positions over the substrates held by the spin chucks. In waiting pods provided at these positions, cleaning processing for the slit nozzle is performed using a cleaning liquid mixed with gas bubbles.

Career Highlights

Mitsuru Asano is currently employed at Screen Semiconductor Solutions Co., Ltd. His work has been instrumental in advancing semiconductor manufacturing processes, particularly in the area of development processing.

Collaborations

Asano collaborates with talented individuals such as Minoru Sugiyama and Fumiya Okazaki. Their combined expertise contributes to the innovative projects at Screen Semiconductor Solutions Co., Ltd.

Conclusion

Mitsuru Asano's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the development of advanced manufacturing processes.