The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 27, 2018
Filed:
May. 16, 2013
Applicants:
Minoru Sugiyama, Kyoto, JP;
Mitsuru Asano, Kyoto, JP;
Fumiya Okazaki, Kyoto, JP;
Inventors:
Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B 3/02 (2006.01); B05B 15/00 (2006.01); B05C 5/02 (2006.01); H01L 21/00 (2006.01); G03G 21/00 (2006.01); B05B 15/02 (2006.01); G03G 15/00 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
G03G 21/00 (2013.01); B05B 15/0258 (2013.01); B05B 15/0266 (2013.01); G03G 15/70 (2013.01); B05C 5/0254 (2013.01); H01L 21/6715 (2013.01);
Abstract
A slit nozzle is moved by a nozzle lifting/lowering mechanism and a nozzle sliding mechanism relative to substrates held in a substantially horizontal attitude by spin chucks. A development liquid is discharged on each substrate from a discharge port of the slit nozzle such that development processing for the substrate is performed. After the development liquid is discharged, the slit nozzle is moved to a waiting position excluding positions over the substrates held by the spin chucks. In waiting pods provided at the waiting positions, cleaning processing for the slit nozzle is performed by a cleaning liquid with gas bubbles mixed therein.