Mitsuo Yabuta

Title: Mitsuo Yabuta: Innovator in Photoresist Technology

Introduction

Mitsuo Yabuta is a prominent inventor based in Samukawa, Japan. He has made significant contributions to the field of photoresist technology, particularly in methods for fine pattern formation. With a total of 2 patents to his name, Yabuta's work has advanced the capabilities of photoresist applications in various industries.

Latest Patents

Yabuta's latest patents focus on innovative methods for high-fidelity fine patterning of photoresist layers. One of his notable inventions is a method that involves dry-process development through exposure to a plasma gas. This technique allows for the creation of finely patterned resist layers with a very high residual film ratio, minimizing the decrease in film thickness. Another patent describes a similar method where a photoresist layer, after being irradiated with actinic rays, is heated to temperatures between 200°C and 500°C. This process enhances the quality of the patterned resist layer, ensuring a high residual film thickness.

Career Highlights

Mitsuo Yabuta is associated with Tokyo Ohka Kogyo Co., Ltd., a company known for its advancements in chemical products for the semiconductor industry. His work at the company has positioned him as a key figure in the development of innovative photoresist technologies.

Collaborations

Yabuta has collaborated with notable colleagues such as Hisashi Nakane and Akira Yokota. Their combined expertise has contributed to the successful development of advanced photoresist methods.

Conclusion

Mitsuo Yabuta's contributions to photoresist technology through his innovative patents have significantly impacted the field. His work continues to influence advancements in semiconductor manufacturing processes.