Company Filing History:
3 out of 51 
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Years Active: 1991-1994
Title: Innovations of Mitsuo Kato
Introduction
Mitsuo Kato is a notable inventor based in Sagamihara, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of four patents. His work primarily focuses on substrate detection devices that enhance the efficiency and accuracy of semiconductor manufacturing processes.
Latest Patents
One of Kato's latest patents is a substrate detecting device designed to detect the presence of a transparent semiconductor wafer in a non-contact manner. This device utilizes a combination of light emitting/receiving sensors and light receiving sensors arranged in pairs. The sensors are strategically positioned to confront each other, allowing for the detection of both transparent and opaque wafers. In the case of a transparent wafer, light emitted from the sensor is reflected off the wafer's surface and detected by the same sensor. Conversely, if an opaque wafer is present, the light is blocked, preventing detection. Another innovative patent by Kato is a substrate detecting system with edge detection. This system employs multiple light-emitting/receiving sections to detect changes in light amounts as the substrates are moved relative to the sensors. This technology is crucial for ensuring the precise handling of substrates in manufacturing environments.
Career Highlights
Mitsuo Kato has worked with prominent companies in the semiconductor industry, including Tokyo Electron Sagami Limited and Tokyo Electron Limited. His experience in these organizations has allowed him to develop and refine his innovative technologies, contributing to advancements in semiconductor manufacturing.
Collaborations
Kato has collaborated with notable colleagues such as Hirofumi Kitayama and Eiichiro Takanabe. Their combined expertise has likely fostered a productive environment for innovation and development in their respective fields.
Conclusion
Mitsuo Kato's contributions to semiconductor technology through his patents and collaborations highlight his role as a significant inventor in the industry. His innovative approaches to substrate detection continue to influence the efficiency of semiconductor manufacturing processes.