Location History:
- Tokyo, JA (1976)
- Tokyo, JP (1980)
Company Filing History:
Years Active: 1976-1980
Title: Innovations of Mitsuo Kakei in Vapor Deposition Technology
Introduction
Mitsuo Kakei is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of vapor deposition technology, holding 2 patents that showcase his innovative approach to thin film applications.
Latest Patents
Kakei's latest patents include a vapor deposition apparatus designed for vacuum deposition of thin films onto substrates. This apparatus features a vacuum container with movable sealing caps that allow for the processing of substrates without disturbing the vacuum. The design includes pre-heating, vapor depositing, cooling, and air locking chambers, ensuring uniform thin-film layers are applied. Another patent involves a continuously processing apparatus that maintains a vacuum while allowing for the feeding and removal of articles. This design incorporates a water-wheel-like conveyor that enhances efficiency and ensures uniform properties of the thin film coating.
Career Highlights
Mitsuo Kakei has had a distinguished career at Canon Kabushiki Kaisha, where he has been instrumental in advancing vapor deposition technologies. His work has contributed to the development of innovative solutions that improve the quality and efficiency of thin film applications.
Collaborations
Kakei has collaborated with notable coworkers such as Keijiro Nishida and Osamu Kamiya, further enhancing the innovative capabilities within his team.
Conclusion
Mitsuo Kakei's contributions to vapor deposition technology reflect his commitment to innovation and excellence. His patents demonstrate a deep understanding of the complexities involved in thin film applications, positioning him as a key figure in this field.