Higashimurayama, Japan

Mitsumasa Koyanagi


Average Co-Inventor Count = 1.5

ph-index = 4

Forward Citations = 93(Granted Patents)


Location History:

  • Kokubunji, JA (1977)
  • Higashimurayama, JP (1987 - 1991)

Company Filing History:


Years Active: 1977-1991

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4 patents (USPTO):Explore Patents

Title: Celebrating the Innovations of Mitsumasa Koyanagi

Introduction: Mitsumasa Koyanagi, an esteemed inventor located in Higashimurayama, Japan, has made significant contributions to the field of semiconductor technology. With a total of four patents to his name, Koyanagi's work is characterized by innovations that enhance the performance and efficiency of semiconductor devices.

Latest Patents: One of Koyanagi's latest innovations is the patent for a trench DRAM cell with different insulator thicknesses. This groundbreaking technology introduces a DRAM architecture where the capacitors of memory cells are formed using moats in a semiconductor substrate. These moats increase the capacitance of the capacitors while maintaining their compact area. Notably, a significant portion of each capacitor is embedded in the moat, with the capacitors electrically isolated from the semiconductor substrate.

Another notable patent by Koyanagi involves a semiconductor device and the process for manufacturing the same. This patent pertains to a method for fabricating n-channel and p-channel MOSFETs, where each transistor has pairs of side walls that are simultaneously formed on both sides of the gate electrode. The precision involved in implanting ions to form source and drain regions showcases Koyanagi's innovative approach to semiconductor manufacturing.

Career Highlights: Koyanagi has made these impressive advancements while working at Hitachi, Ltd., a global leader in technology and electronics. His contributions in the realm of microelectronics reflect his dedication to pushing the boundaries of semiconductor design and functionality.

Collaborations: Throughout his career, Koyanagi has collaborated with notable colleagues, including Hiroko Kaneko and Yasuo Wada. Their combined efforts in the field of semiconductor technology have fostered an environment of innovation and excellence.

Conclusion: Mitsumasa Koyanagi's ingenuity and dedication to semiconductor technology have led to notable patents that demonstrate a deep understanding of the intricate workings of electronic devices. His work not only benefits his immediate workplace at Hitachi, Ltd. but also contributes to the broader landscape of technology, paving the way for future advancements in the industry.

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