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For the Inventor, By the Inventor

Yokkaichi, Japan

Mitsuhito Suwa

This inventor holds 9 USPTO granted patents. Top assignees: Jsr Corporation, Dsm N.v., Japan Synthetic Rubber Co., Ltd.. Active years: 1998-2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mitsuhito Suwa. Retrieved from https://idiyas.com/inventor/mitsuhito-suwa-v5dgg651

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 9

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 5

Forward Citations = 131(Granted Patents)


Location History:

  • Mie, JP (2001)
  • Yokkaichi, JP (1998 - 2004)

Company Filing History:

goldMedal5 out of 1,078 
 
Jsr Corporation
 patents
silverMedal3 out of 475 
 
Dsm N.v.
 patents
bronzeMedal1 out of 377 
 
Japan Synthetic Rubber Co., Ltd.
 patents
4. 1 out of 834,601 
Other
 patents
where one patent can have more than one assignee

Years Active: 1998-2004

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9 patents (USPTO):Explore Patents
1. 6727032 - Radiation-sensitive resin composition (2004-04-27),
2. 6692887 - Radiation-sensitive resin composition (2004-02-17),
3. 6322949 - Radiation sensitive resin composition (2001-11-27),
4. 6309747 - Liquid curable resin composition for optical fibers (2001-10-30),
5. 6187504 - Radiation sensitive resin composition (2001-02-13),
6. 6180316 - Radiation sensitive resin composition (2001-01-30),
7. 5913004 - Optical glass fiber coating composition (1999-06-15),
8. 5804311 - Liquid curable resin composition for optical fibers (1998-09-08),
9. 5787218 - Liquid curable urethane (meth)acrylate containing resin composition (1998-07-28),

Title: Mitsuhito Suwa: Innovator in Radiation-Sensitive Resin Compositions

Introduction

Mitsuhito Suwa is a prominent inventor based in Yokkaichi, Japan. He has made significant contributions to the field of radiation-sensitive resin compositions, holding a total of 9 patents. His work has been instrumental in advancing technologies related to photoresist materials.

Latest Patents

Among his latest patents is a radiation-sensitive resin composition that includes (A) a resin containing an alicyclic skeleton in its backbone, and (B) a radiation-sensitive acid-generating agent. This innovative composition is noted for its excellent transparency with respect to radiation and dry etching resistance. It can produce a photoresist pattern that demonstrates outstanding adhesion to substrates, sensitivity, resolution, and developability.

Career Highlights

Mitsuhito Suwa has worked with notable companies such as JSR Corporation and DSM N.V. His experience in these organizations has allowed him to refine his expertise in the development of advanced materials.

Collaborations

Some of his notable coworkers include Toru Kajita and Shin-ichiro Iwanaga. Their collaborative efforts have contributed to the success of various projects in the field of resin compositions.

Conclusion

Mitsuhito Suwa's innovative work in radiation-sensitive resin compositions has made a significant impact in the industry. His patents reflect a commitment to advancing technology and improving material performance.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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