Yokkaichi, Japan

Mitsuhito Suwa


Average Co-Inventor Count = 4.0

ph-index = 5

Forward Citations = 130(Granted Patents)


Location History:

  • Mie, JP (2001)
  • Yokkaichi, JP (1998 - 2004)

Company Filing History:


Years Active: 1998-2004

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9 patents (USPTO):Explore Patents

Title: Mitsuhito Suwa: Innovator in Radiation-Sensitive Resin Compositions

Introduction

Mitsuhito Suwa is a prominent inventor based in Yokkaichi, Japan. He has made significant contributions to the field of radiation-sensitive resin compositions, holding a total of 9 patents. His work has been instrumental in advancing technologies related to photoresist materials.

Latest Patents

Among his latest patents is a radiation-sensitive resin composition that includes (A) a resin containing an alicyclic skeleton in its backbone, and (B) a radiation-sensitive acid-generating agent. This innovative composition is noted for its excellent transparency with respect to radiation and dry etching resistance. It can produce a photoresist pattern that demonstrates outstanding adhesion to substrates, sensitivity, resolution, and developability.

Career Highlights

Mitsuhito Suwa has worked with notable companies such as JSR Corporation and DSM N.V. His experience in these organizations has allowed him to refine his expertise in the development of advanced materials.

Collaborations

Some of his notable coworkers include Toru Kajita and Shin-ichiro Iwanaga. Their collaborative efforts have contributed to the success of various projects in the field of resin compositions.

Conclusion

Mitsuhito Suwa's innovative work in radiation-sensitive resin compositions has made a significant impact in the industry. His patents reflect a commitment to advancing technology and improving material performance.

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