Mitsuhiro Ohkuni

Title: Mitsuhiro Ohkuni: Innovator in Plasma Etching Technology

Introduction

Mitsuhiro Ohkuni is a prominent inventor based in Nara, Japan. He has made significant contributions to the field of plasma etching, holding a total of 12 patents. His innovative work has advanced the technology used in semiconductor manufacturing and other applications.

Latest Patents

Ohkuni's latest patents include a plasma etching method and a plasma etching apparatus. The plasma etching method involves first forming a coating film on the inner surface of the chamber. Next, an etching process is performed on a wafer under conditions where the coating film is present. After this, a reaction product that has adhered to the coating film during the etching process is removed along with the coating film. Each of these processes is executed at a frequency that maintains a consistent condition of the chamber's inner surface at the start of the etching process. The plasma etching apparatus consists of a chamber capable of reducing pressure, a substrate support inside the chamber, and a first electrode that generates plasma of an etching gas. Additionally, it features a second electrode with multiple separated electrodes that can be powered independently.

Career Highlights

Throughout his career, Mitsuhiro Ohkuni has worked with notable companies such as Matsushita Electric Industrial Co., Ltd. and Matsushita Electronics Corporation. His experience in these organizations has contributed to his expertise in plasma etching technology.

Collaborations

Ohkuni has collaborated with several professionals in his field, including Masafumi Kubota and Noboru Nomura. These collaborations have further enriched his work and innovations.

Conclusion

Mitsuhiro Ohkuni's contributions to plasma etching technology have made a significant impact in the industry. His innovative patents and collaborations highlight his role as a leading inventor in this specialized field.