The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 2001
Filed:
Sep. 18, 1998
Applicant:
Inventors:
Mitsuhiro Ohkuni, Nara, JP;
Shunsuke Kugo, Nagaokakyo, JP;
Tomoyuki Sasaki, Uji, JP;
Kenji Tateiwa, Osaka, JP;
Hideo Nikoh, Otsu, JP;
Assignee:
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/100 ;
U.S. Cl.
CPC ...
H01L 2/100 ;
Abstract
After an organic bottom anti-reflective coating (,) is deposited on an underlying film (,), a resist pattern (,) is formed on the organic bottom anti-reflective coating (,). Dry etching is performed with respect to the organic bottom anti-reflective coating (,) masked with the resist pattern (,) to form an anti-reflective coating pattern. The dry-etching of the organic bottom anti-reflective coating (,) is performed by using etching gas containing gas having the S component such as SO,/O,-based etching gas or COS/O,-based etching gas.