The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 2001
Filed:
Feb. 05, 1998
Mitsuhiro Ohkuni, Nara, JP;
Masafumi Kubota, Osaka, JP;
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Abstract
In etching a target film to be etched antecedently, an etching rate is measured at each of the peripheral and central portions of the target film. If the etching rate is higher at the peripheral portion of the target film to be etched antecedently than at the central portion thereof, a focus ring positioned around a wafer is moved upward in etching a target film to be etched subsequently, so that the quantity of radicals arriving at the peripheral portion of the target film to be etched subsequently is decreased. If the etching rate is lower at the peripheral portion of the target film to be etched antecedently than at the central portion thereof, the focus ring is moved downward in etching the target film to be etched subsequently, so that the quantity of radicals arriving at the peripheral portion of the target film to be etched subsequently is increased.