Yao, Japan

Mitsuhiro Ogawa


Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 36(Granted Patents)


Location History:

  • Yao, JP (1993)
  • Osaka, JP (1999)

Company Filing History:


Years Active: 1993-1999

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2 patents (USPTO):Explore Patents

Title: The Innovations of Mitsuhiro Ogawa

Introduction

Mitsuhiro Ogawa, an esteemed inventor from Yao, Japan, has made significant contributions to the field of cleaning technologies. With a total of two patents to his name, Ogawa has focused on developing advanced methods and apparatuses for cleaning applications, particularly in the semiconductor industry.

Latest Patents

Mitsuhiro Ogawa's latest patents include a "Two-Fluid Cleaning Jet Nozzle and Cleaning Apparatus, and Method" and an "Apparatus and Method for Cleaning Semiconductor Wafers."

The two-fluid cleaning jet nozzle features an atomizing unit with an atomizing tube that utilizes pressurized gas to atomize liquid into droplets. An accelerating unit then jets these droplets against a workpiece, efficiently removing dust particles. Notably, the sectional area of the atomizing tube for gas flow is larger than that of the accelerating tube for liquid droplets and gas, and the design includes options like a straight cylindrical tube or a Laval nozzle.

The apparatus and method for cleaning semiconductor wafers improve the cleaning process by incorporating an exhaust chamber with a sub-outlet, which slows down the flow of frozen micro-particles to prevent them from rebounding towards the wafer. As a result, cleaned wafers maintain higher cleanliness standards.

Career Highlights

Throughout his career, Ogawa has worked with notable companies such as Mitsubishi Electric Corporation and Taiyo Toyo Sanso Co., Ltd. His expertise in developing cleaning technologies has positioned him as a valuable asset in the field.

Collaborations

Ogawa has collaborated with talented individuals like Itaru Kanno and Masuo Tada, contributing to the advancement of cleaning solutions and enhancing the technology landscape.

Conclusion

Mitsuhiro Ogawa's innovative patents in cleaning technologies underscore his dedication to improving manufacturing processes, particularly in the semiconductor sector. His advancements reflect a deep understanding of the challenges in cleaning applications, showcasing the impactful work of inventors who strive for excellence in technology.

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