Mitsubishi Denki Kabushiki Kaisha

Taiyo Sanso Co., Ltd.

Taiyo Toyo Sanso Co., Ltd.

Mitsuhiro Ogawa

Itaru Kanno

Masuo Tada

Toshiki Ouno

Satoru Kotou

Taizou Ejima

A two-fluid cleaning jet nozzle has an atomizing unit provided with an atomizing tube in which a liquid is atomized by a pressurized gas into liquid droplets, and an accelerating unit provided with an accelerating tube which accelerates and jets the liquid droplets against the surface of a workpiece to remove dust particles adhering to the surface of the workpiece. The sectional area of the atomizing tube available for gas flow is greater than the sectional area of the accelerating tube available for flow of the gas and the liquid droplets. The accelerating tube has the shape of a straight cylindrical tube or a Laval nozzle.

Two-fluid cleaning jet nozzle and cleaning apparatus, and method

In an apparatus and a method for cleaning semiconductor wafers, an exhaust chamber having a sub-outlet slows down the flow of frozen micro-particles and thus prevents rebounding of the particles toward the wafer. Therefore, dust or the like is kept away from a cleaned semiconductor wafer so that the semiconductor wafers are cleaned more thoroughly.

Apparatus and method for cleaning semiconductor wafers

Growing community of inventors

Yao, Japan

Mitsuhiro Ogawa