Takaoka, Japan

Mitsuhiro Matsuda

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi-Kokusai Electric Inc.. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mitsuhiro Matsuda. Retrieved from https://idiyas.com/inventor/mitsuhiro-matsuda-ojiv7vpf

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: Mitsuhiro Matsuda: Innovator in Semiconductor Processing Technology

Introduction

Mitsuhiro Matsuda is a prominent inventor based in Takaoka, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative patent that enhances the efficiency of substrate processing systems.

Latest Patents

Matsuda holds a patent for a "Substrate processing system and operation inspecting method." This invention provides a solution for automatically inspecting the operation of various parts of semiconductor manufacturing apparatuses. It does so without increasing the load on the main controller of the semiconductor manufacturing apparatus. The system allows for the online sharing and collection of inspection data through a network, enabling a comprehensive inspection of the operation state by an inspecting computer.

Career Highlights

Mitsuhiro Matsuda is associated with Hitachi Kokusai Electric Inc., where he has been instrumental in advancing semiconductor technology. His work focuses on improving the operational efficiency and reliability of semiconductor manufacturing processes.

Collaborations

Matsuda has collaborated with notable colleagues, including Yasuhiro Joho and Hideto Yamaguchi, contributing to various projects within the semiconductor industry.

Conclusion

Mitsuhiro Matsuda's innovative work in substrate processing systems exemplifies the importance of advancements in semiconductor technology. His contributions continue to influence the efficiency of manufacturing processes in this critical field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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