Takasaki, Japan

Mitsuhiro Furumoto


Average Co-Inventor Count = 2.4

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2014-2015

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2 patents (USPTO):Explore Patents

Title: Mitsuhiro Furumoto: Innovator in Lithography Technology

Introduction

Mitsuhiro Furumoto is a prominent inventor based in Takasaki, Japan. He has made significant contributions to the field of lithography, holding a total of 2 patents. His work focuses on developing advanced systems and methods that enhance the precision and efficiency of lithographic processes.

Latest Patents

Furumoto's latest patents include a lithography system and a lithography method. The lithography system features at least two lithography apparatuses positioned on the same fixed base. Each apparatus consists of an object, a moving body, and a vibration isolation unit. The control unit manages the lithography apparatuses, adjusting the vibration isolation unit in the first apparatus based on instructions from the second apparatus. This innovative design aims to minimize vibrations affecting the object being isolated.

Another notable invention is the anti-vibration apparatus. This device includes an anti-vibration base supported by multiple mechanisms and actuators that apply force to reduce vibrations. It features an obtaining unit that collects vibration data, a calculation unit that determines the necessary force to mitigate vibrations, and a distribution unit that allocates this force among the actuators.

Career Highlights

Mitsuhiro Furumoto is associated with Canon Inc., a leading company in imaging and printing technologies. His work at Canon has allowed him to push the boundaries of lithography technology, contributing to advancements that benefit various industries.

Collaborations

Furumoto has collaborated with notable colleagues, including Keiji Emoto and Tosiya Asano. Their combined expertise has fostered innovation and development in lithographic systems.

Conclusion

Mitsuhiro Furumoto's contributions to lithography technology exemplify his dedication to innovation. His patents reflect a commitment to enhancing the efficiency and precision of lithographic processes, making a significant impact in the field.

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