Canon Kabushiki Kaisha

Mitsuhiro Furumoto

Keiji Emoto

Tosiya Asano

A lithography system includes at least two lithography apparatuses disposed on the same fixed base, each of which includes an object, a moving body, and a vibration isolation unit. A control unit configured to control the lithography apparatuses controls a vibration isolation unit included in a first lithography apparatus based on driving instruction information to be given to a moving body included in a second lithography apparatus, and a control indicator regarding vibration directed onto an object to be vibration-isolated included in the first lithography apparatus due to a moving operation of the moving body.

Lithography system and lithography method

The present invention provides an anti-vibration apparatus including an anti-vibration base, a plurality of supporting mechanisms configured to support the anti-vibration base, a plurality of actuators configured to apply a force to the anti-vibration base, an obtaining unit configured to obtain vibration data which represents vibrations on the anti-vibration base, a first calculation unit configured to calculate, based on the vibration data obtained by the obtaining unit, a force to be applied to the anti-vibration base so as to reduce the vibrations on the anti-vibration base, and a distribution unit configured to distribute the force calculated by the first calculation unit to forces to be applied by the plurality of actuators to the anti-vibration base.

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Takasaki, Japan

Mitsuhiro Furumoto