The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 17, 2015

Filed:

Dec. 13, 2011
Applicants:

Mitsuhiro Furumoto, Takasaki, JP;

Keiji Emoto, Saitama, JP;

Inventors:

Mitsuhiro Furumoto, Takasaki, JP;

Keiji Emoto, Saitama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G05B 13/04 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70725 (2013.01); G03F 7/709 (2013.01); G03F 7/70991 (2013.01); H01J 2237/0216 (2013.01); H01J 2237/3175 (2013.01); Y10S 977/887 (2013.01);
Abstract

A lithography system includes at least two lithography apparatuses disposed on the same fixed base, each of which includes an object, a moving body, and a vibration isolation unit. A control unit configured to control the lithography apparatuses controls a vibration isolation unit included in a first lithography apparatus based on driving instruction information to be given to a moving body included in a second lithography apparatus, and a control indicator regarding vibration directed onto an object to be vibration-isolated included in the first lithography apparatus due to a moving operation of the moving body.


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