Mitsuhiko Komakine

Title: Mitsuhiko Komakine: Innovator in EUV Lithography

Introduction

Mitsuhiko Komakine is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of extreme ultraviolet (EUV) lithography, which is crucial for advanced semiconductor manufacturing. With a total of 3 patents to his name, his work focuses on enhancing the efficiency and effectiveness of EUV technology.

Latest Patents

Komakine's latest patents include innovative solutions such as a reflective layer-equipped substrate for EUV lithography, a reflective mask blank for EUV lithography, and a reflective mask for EUV lithography. These patents address the challenges of reflectivity deterioration due to oxidation of a ruthenium (Ru) protective layer. His inventions provide a multilayer mirror for EUV lithography that includes a substrate, a reflective layer for reflecting EUV light, and a protective layer, all designed to improve performance and longevity.

Career Highlights

Mitsuhiko Komakine is currently employed at Asahi Glass Company, Limited, where he continues to push the boundaries of EUV lithography technology. His expertise in this area has positioned him as a key figure in the development of advanced materials and processes that are essential for modern semiconductor fabrication.

Collaborations

Throughout his career, Komakine has collaborated with notable colleagues such as Masaki Mikami and Yoshiaki Ikuta. These partnerships have fostered a collaborative environment that enhances innovation and drives progress in the field of lithography.

Conclusion

Mitsuhiko Komakine's contributions to EUV lithography exemplify the importance of innovation in technology. His patents and ongoing work at Asahi Glass Company, Limited, highlight his role as a leading inventor in this critical area of semiconductor manufacturing.