Asahi Glass Company, Limited

Mitsuhiko Komakine

Yoshiaki Ikuta

Masaki Mikami

Masami Kaneko

Shohei Chida

Provided are an EUV mask blank in which deterioration in reflectivity due to oxidation of a Ru protective layer is prevented, a reflective layer-equipped substrate to be used for producing the EUV mask blank, and a process for producing the reflective layer-equipped substrate. A reflective layer-equipped substrate for EUV lithography comprising a substrate, and a reflective layer for reflecting EUV light and a protective layer for protecting the reflective layer, formed in this order on the substrate, wherein the reflective layer is a Mo/Si multilayer reflective film, the protective layer is a Ru layer or a Ru compound layer, and an intermediate layer containing from 0.5 to 25 at % of nitrogen and from 75 to 99.5 at % of Si is formed between the reflective layer and the protective layer.

Reflective layer-equipped substrate for EUV lithography, reflective mask blank for EUV lithography, reflective mask for EUV lithography, and process for production of the reflective layer-equipped substrate

Provided are a multilayer mirror for EUVL in which deterioration in reflectivity due to oxidation of a Ru protective layer is prevented, and a process for its production. A multilayer mirror for EUV lithography comprising a substrate, and a reflective layer for reflecting EUV light and a protective layer for protecting the reflective layer, formed in this order on the substrate, wherein the reflective layer is a Mo/Si multilayer reflective film, the protective layer is a Ru layer or a Ru compound layer, and an intermediate layer containing from 0.5 to 25 at % of nitrogen and from 75 to 99.5 at % of Si is formed between the reflective layer and the protective layer.

Multilayer mirror for EUV lithography and process for its production

An apparatus for polishing an edge surface of a glass substrate for magnetic recording media. The apparatus includes a grindstone including abrasive grains mixed with a resin. The grindstone is configured to polish at least the edge surface of the glass substrate. The grindstone has a reentrant groove with a bottom surface and sidewall surfaces such that the bottom surface of the reentrant groove contacts the edge surface of the glass substrate and the sidewall surfaces of the reentrant groove contacts chamfered sidewalls of the glass substrate. The reentrant groove and sidewall surfaces are formed in the resin of the grindstone by pressing the glass substrate into the resin of the grindstone with a force higher than a pressing force during polishing.

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Tokyo, Japan

Mitsuhiko Komakine