Nagano, Japan

Mitsue Ogawa


Average Co-Inventor Count = 4.5

ph-index = 2

Forward Citations = 19(Granted Patents)


Company Filing History:


Years Active: 1999-2007

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2 patents (USPTO):Explore Patents

Title: Mitsue Ogawa: A Pioneer in Water Sucking and Polishing Technologies

Introduction

Mitsue Ogawa, a distinguished inventor based in Nagano, Japan, has contributed significantly to the fields of water management and wafer polishing technologies. With a total of two patents to her name, Ogawa's innovative methods have paved the way for advancements in these industries, enhancing efficiency and effectiveness in the processes involved.

Latest Patents

Mitsue Ogawa's recent patents highlight her expertise and innovative spirit. The first patent, titled "Method of Sucking Water and Water Sucking Device," outlines a novel approach to removing excess water from a backing member adhered to a plate of a polishing apparatus. This method employs a water-absorbing member to press against the backing member, efficiently absorbing and then sucking away the excess water.

The second patent, "Polishing System for Polishing Wafer," describes an intricate polishing system that incorporates multiple units working in harmony. This system includes an adhering unit for affixing a wafer to a carrying plate using liquid, a polishing unit with a polishing plate, and units dedicated to conveying, dismounting, and cleaning the carrying plate. By forming these units into a loop line, the process ensures that carrying plates are continuously circulated, optimizing the wafer polishing workflow.

Career Highlights

Mitsue Ogawa has had a noteworthy career, marking her presence at esteemed companies such as Fujikoshi Kikai Kogyo and Fujikoshi Machinery Corporation. Throughout her career, she has proven her capabilities in driving innovations that address practical challenges in her field.

Collaborations

In her endeavors, Ogawa has collaborated with prominent coworkers such as Yoshio Nakamura and Makoto Nakajima. These partnerships have facilitated knowledge exchange and driven collaborative efforts toward innovative solutions in technology and engineering.

Conclusion

Mitsue Ogawa's contributions to water management and wafer polishing technologies showcase her innovative prowess and dedication to her field. With her patents reflecting practical solutions to industry challenges, Ogawa continues to inspire future inventors and engineers with her resolute pursuit of innovation.

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