Mitsuaki Morigami

Title: Innovations of Mitsuaki Morigami

Introduction

Mitsuaki Morigami is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of resist pattern formation, holding 2 patents that enhance the efficiency and effectiveness of lithography processes.

Latest Patents

Morigami's latest patents focus on resist patterns and methods of forming these patterns. The proposed method involves adjusting contact angles between the surface of a resist and a rinse within a predetermined range. A volatile surfactant, which does not remain after drying, is mixed into the rinse to reduce surface tension. The rinse is then dried under critical conditions to prevent surface tension from exerting. This innovative approach weakens or nullifies the attractive force between resist patterns, effectively preventing the falling of patterns, especially during the formation of fine resist patterns or those with high aspect ratios. Additionally, depending on the structure of the resist pattern, it is possible to prevent the outermost main patterns from collapsing. This invention not only increases product yield but can also be applied to various lithography illumination sources, including light, electron, X-ray, and ion beam technologies.

Career Highlights

Mitsuaki Morigami is associated with Sortec Corporation, where he continues to develop and refine his innovative techniques in resist pattern formation. His work has been instrumental in advancing the capabilities of lithography processes.

Collaborations

Morigami has collaborated with notable coworkers, including Toshihiko Tanaka and Iwao Higashikawa, contributing to the collective expertise and innovation within Sortec Corporation.

Conclusion

Mitsuaki Morigami's contributions to resist pattern formation represent a significant advancement in lithography technology. His innovative methods not only enhance product yield but also broaden the application of lithography across various illumination sources.