Mitrabhanu Sahu

Title: Inventor Mitrabhanu Sahu: A Pioneer in Reducing Substrate Surface Scratching

Introduction

Mitrabhanu Sahu is a distinguished inventor based in San Jose, California, known for his innovative contributions to the field of semiconductor manufacturing. With a total of two patents to his name, Sahu has been instrumental in enhancing the efficiency and quality of substrate processing, making significant strides utilizing machine learning techniques.

Latest Patents

Sahu's latest patents focus on reducing substrate surface scratching through advanced machine learning approaches. The first patent outlines a process where recipe data associated with substrate processing is input into a trained machine learning model. This model then determines optimal process recipe settings, which effectively minimize scratching on the substrate surfaces during manufacturing. The second patent details the methods and systems for mitigating substrate particle scratching. This involves training a machine learning model to predict process recipe settings for substrate temperature control by utilizing historical data from prior processes, resulting in a refined approach to maintain a target scratch profile on substrate surfaces.

Career Highlights

Currently, Mitrabhanu Sahu works at Applied Materials, Inc., a leading company in the field of materials engineering and manufacturing. His innovative work has contributed to advancements that help maintain high quality in semiconductor fabrication processes. His commitment to enhancing manufacturing techniques highlights his pivotal role in the industry.

Collaborations

During his career, Sahu has collaborated with talented professionals, including his coworkers Kartik Bhupendra Shah and Satish Radhakrishnan. Their combined expertise and collaborative efforts have helped fuel advancements in substrate processing technologies.

Conclusion

Mitrabhanu Sahu's contributions to semiconductor manufacturing and machine learning represent a significant part of the ongoing evolution in innovative technologies. With his patented methods focused on reducing substrate surface scratching, he continues to lead the way in improving process efficiencies in the industry.