The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 05, 2023

Filed:

Dec. 19, 2022
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Kartik B Shah, Saratoga, CA (US);

Satish Radhakrishnan, San Jose, CA (US);

Karthik Ramanathan, Bangalore, IN;

Karthikeyan Balaraman, Bangalore, IN;

Adolph Miller Allen, Oakland, CA (US);

Xinyuan Chong, Milpitas, CA (US);

Mitrabhanu Sahu, San Jose, CA (US);

Wenjing Xu, San Jose, CA (US);

Michael Sterling Jackson, Sunnyvale, CA (US);

Weize Hu, Sunnyvale, CA (US);

Feng Chen, San Jose, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05B 13/02 (2006.01); G05B 13/04 (2006.01);
U.S. Cl.
CPC ...
G05B 13/0265 (2013.01); G05B 13/048 (2013.01);
Abstract

Process recipe data associated a process to be performed for a substrate at a process chamber is provided as input to a trained machine learning model. A set of process recipe settings for the process that minimizes scratching on one or more surfaces of the substrate is determined based on one or more outputs of the machine learning model. The process is performed for the substrate at the process chamber in accordance with the determined set of process recipe settings.


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