Company Filing History:
Years Active: 2014-2016
Title: Misato Oonishi: Innovator in Photosensitive Resin Technology
Introduction
Misato Oonishi is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of photosensitive resin technology, holding a total of 3 patents. His work focuses on developing innovative resin compositions that have various applications in the industry.
Latest Patents
Oonishi's latest patents include a negative photosensitive resin composition and its cured product. This composition contains an epoxy resin with multiple epoxy groups, an alkali-soluble resin, and a cationic photopolymerization initiator. The epoxy resin is derived from a reaction between a phenol derivative and an epihalohydrin. Another notable patent is for an alkali-developing-type photosensitive resin composition. This composition comprises a polycarboxylic acid resin, an epoxy resin with multiple epoxy groups, and a photoacid generator, with specific ratios of components to enhance performance.
Career Highlights
Oonishi is currently employed at Nippon Kayaku Kabushiki Kaisha, where he continues to innovate in the field of resin technology. His work has been instrumental in advancing the capabilities of photosensitive materials, making them more efficient and effective for various applications.
Collaborations
Some of his notable coworkers include Nao Honda and Naoko Imaizumi, who contribute to the collaborative environment that fosters innovation at Nippon Kayaku.
Conclusion
Misato Oonishi's contributions to photosensitive resin technology highlight his role as a key inventor in this field. His patents reflect a commitment to advancing material science and innovation.