The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2014
Filed:
Jul. 13, 2011
Applicants:
Misato Oonishi, Tokyo, JP;
Naoko Imaizumi, Tokyo, JP;
Ryo Sakai, Tokyo, JP;
Nao Honda, Tokyo, JP;
Tadayuki Kiyoyanagi, Tokyo, JP;
Inventors:
Misato Oonishi, Tokyo, JP;
Naoko Imaizumi, Tokyo, JP;
Ryo Sakai, Tokyo, JP;
Nao Honda, Tokyo, JP;
Tadayuki Kiyoyanagi, Tokyo, JP;
Assignee:
Nippon Kayaku Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/038 (2006.01); C09J 163/00 (2006.01); C08L 63/04 (2006.01); C08G 59/68 (2006.01); G03F 7/004 (2006.01); G03F 7/039 (2006.01); G03F 7/075 (2006.01); H05K 3/28 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C09J 163/00 (2013.01); C08L 63/04 (2013.01); C08G 59/687 (2013.01); G03F 7/0382 (2013.01); H05K 3/287 (2013.01); G03F 7/0385 (2013.01); G03F 7/038 (2013.01); G03F 7/039 (2013.01); G03F 7/0757 (2013.01); Y10S 430/115 (2013.01); Y10S 430/122 (2013.01);
Abstract
Disclosed is a photosensitive resin composition containing a cationic photopolymerization initiator (A) and an epoxy resin (B) having two or more epoxy groups in each molecule, which is characterized in that the cationic photopolymerization initiator (A) is a cationic photopolymerization initiator (A-1) that is represented by formula (1).