This inventor holds 1 USPTO granted patent. Top assignee: University of Arkansas. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Mirsaeid Sarollahi: Innovator in High Temperature Capacitor Technology
Introduction
Mirsaeid Sarollahi is a notable inventor based in Fayetteville, AR (US). He has made significant contributions to the field of capacitor technology, particularly for high temperature systems. His innovative work has led to the development of a unique capacitor design that addresses the challenges posed by extreme temperature conditions.
Latest Patents
Sarollahi holds a patent for "Capacitors for high temperature systems, methods of forming same, and applications of same." This patent describes a capacitor that includes a substrate made from silicon carbide material, a dielectric stack layer, a Schottky contact layer, and an Ohmic contact layer. The first layer of the dielectric stack is formed with aluminum nitride (AlN) epitaxially, while the second layer is formed with aluminum oxide (AlO). These materials are ultrawide band gap materials, allowing the capacitor to maintain capacitance changes of less than 10% between −250° C. and 600° C. This capability makes it highly effective for high temperature applications.
Career Highlights
Sarollahi is affiliated with the University of Arkansas, where he continues to advance his research and development efforts. His work has garnered attention for its potential applications in various industries that require reliable performance under extreme conditions.
Collaborations
Some of his notable coworkers include Rohith Allaparthi and Xiangbo Meng. Their collaborative efforts contribute to the innovative research environment at the University of Arkansas.
Conclusion
Mirsaeid Sarollahi's contributions to high temperature capacitor technology exemplify the importance of innovation in engineering. His patented designs not only push the boundaries of existing technology but also pave the way for future advancements in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
