Company Filing History:
Years Active: 2011
Title: Innovations of Miow Chin Tan in Metal Silicide Contacts
Introduction
Miow Chin Tan is a notable inventor based in Singapore, recognized for his contributions to the field of semiconductor manufacturing. He has developed innovative solutions that address challenges in metal silicide contacts, enhancing the efficiency and reliability of semiconductor devices.
Latest Patents
Miow Chin Tan holds a patent for "Reduced metal pipe formation in metal silicide contacts." This invention focuses on reducing or avoiding the formation of metal pipes that can occur during the creation of metal silicide contacts. By forming an epitaxial layer over the diffusion region, where the metal silicide contact is established, the invention minimizes defects and enhances the diffusion of metal atoms or molecules.
Career Highlights
Miow Chin Tan is associated with Chartered Semiconductor Manufacturing Ltd, a prominent corporation in the semiconductor industry. His work has significantly impacted the manufacturing processes, leading to improved product quality and performance.
Collaborations
Some of his coworkers include Wei Hua Tong and Lap Chan, who have collaborated with him on various projects within the semiconductor field.
Conclusion
Miow Chin Tan's innovative work in reducing metal pipe formation in metal silicide contacts showcases his expertise and commitment to advancing semiconductor technology. His contributions continue to influence the industry positively.