This inventor holds 1 USPTO granted patent. Top assignee: Riken & Sii Nanotechnology Inc.. Active years: 2007.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2007
Title: Minuru Kawamura: Focused Ion Beam Technology
Introduction
Minuru Kawamura is an inventor associated with Saitama, Japan. His recorded patent work concerns focused ion beam technology and the formation of narrow gaps between electrodes.
Latest Patents
Kawamura is associated with 1 patent: “Charged Particle Beam Apparatus and Method of Forming Electrodes Having Narrow Gap Therebetween by Using the Same.” The invention describes a focused ion beam apparatus with two probes contacting separate points on a sample, a voltage source applying a constant voltage between those points, and an ammeter monitoring the resulting current. A conductive film is formed between the points using a deflection electrode and a gas gun. When the measured current reaches a predetermined value, a blanking electrode turns off the focused charged particle beam.
Career Highlights
The patent reflects work on controlling conductive-film formation with a focused charged particle beam. Its current-monitoring approach provides a way to stop irradiation when the electrode gap reaches a specified condition. Kawamura is associated with Riken and SII Nanotechnology Inc.
Collaborations
Yoshinobu Aoyagi and Toshiaki Fujii are identified as Kawamura’s coworkers. Their names are provided as professional associations, without further details about their specific roles in the patent.
Conclusion
Minuru Kawamura’s recorded invention addresses precise electrode-gap formation through focused ion beam processing and electrical-current monitoring.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile