The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 27, 2007

Filed:

Aug. 03, 2005
Applicants:

Toshiaki Fujii, Chiba, JP;

Masao Abe, Chiba, JP;

Kunji Shigeto, Saitama, JP;

Minuru Kawamura, Saitama, JP;

Alekber Yu Kasumov, Saitama, JP;

Kazuhito Tsukagoshi, Saitama, JP;

Yoshinobu Aoyagi, Saitama, JP;

Inventors:

Toshiaki Fujii, Chiba, JP;

Masao Abe, Chiba, JP;

Kunji Shigeto, Saitama, JP;

Minuru Kawamura, Saitama, JP;

Alekber Yu Kasumov, Saitama, JP;

Kazuhito Tsukagoshi, Saitama, JP;

Yoshinobu Aoyagi, Saitama, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61N 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A focused ion beam apparatus having two pieces of probers brought into contact with two points of a surface of a sample, a voltage source for applying a constant voltage between the two points with which the probers are brought into contact, and an ammeter for measuring a current flowing between the two points, in which a conductive film is formed to narrow a gap thereof between the two points by operating a deflection electrode and a gas gun and the current flowing between the two points is monitored, and when the current becomes a predetermined value, a focused charged particle beam irradiated to the surface of the sample is made OFF by the blanking electrode.


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