This inventor holds 1 USPTO granted patent. Top assignee: Riken & Sii Nanotechnology Inc.. Active years: 2007.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2007
Title: Alekber Yu Kasumov and Focused Ion Beam Technology.
Introduction
Alekber Yu Kasumov is an inventor associated with Saitama, Japan. The supplied information lists him as having 1 patent and connects his work with Riken & SII Nanotechnology Inc.
Latest Patents
Kasumov is named on the patent “Charged Particle Beam Apparatus and Method of Forming Electrodes Having Narrow Gap Therebetween by Using the Same.” The invention describes a focused ion beam apparatus that uses two probers to contact separate points on a sample, applies a constant voltage between those points, and measures the resulting current. A conductive film is formed to narrow the gap between the points. The apparatus monitors the current and uses a blanking electrode to turn off the focused charged particle beam when the current reaches a predetermined value.
Career Highlights
The patent reflects work on focused ion beam equipment and the controlled formation of narrow gaps between electrodes. The supplied information associates Kasumov with Riken & SII Nanotechnology Inc.
Collaborations
The listed collaborators include Masao Abe and Kunji Shigeto.
Conclusion
Alekber Yu Kasumov’s recorded patent concerns a focused ion beam technique for forming narrow electrode gaps with current monitoring and beam control.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile