Ikoma, Japan

Minoru Yamada

This inventor holds 1 USPTO granted patent. Top assignee: Sumitomo Metal Industries, Inc.. Active years: 1998.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Minoru Yamada. Retrieved from https://idiyas.com/inventor/minoru-yamada-d63gvb43

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 38(Granted Patents)


Company Filing History:


Years Active: 1998

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1 patent (USPTO):Explore Patents

Title: Minoru Yamada: Innovator in Plasma Processing Technology

Introduction

Minoru Yamada is a notable inventor based in Ikoma, Japan. He has made significant contributions to the field of plasma processing technology. His innovative work has led to the development of a unique plasma processing apparatus that addresses critical challenges in the industry.

Latest Patents

Minoru Yamada holds a patent for a plasma processing apparatus. This apparatus comprises a reaction chamber, an upper electrode, and a lower electrode that functions as a sample stage. It includes means of supplying RF power between the electrodes, with one electrode and the reaction chamber grounded. The RF impedance matching means ensure that the capacitance between the grounded electrode and the reaction chamber is 125 pF or less. This design stabilizes plasma generation and alleviates issues related to the repeatability of plasma processing. The apparatus is particularly suitable for etching applications that utilize chlorine or bromine compound gases.

Career Highlights

Minoru Yamada is associated with Sumitomo Metal Industries, Inc., where he has been instrumental in advancing plasma processing technologies. His work has been recognized for its impact on improving the efficiency and reliability of plasma processing systems.

Collaborations

Minoru Yamada has collaborated with Toshihiro Hayami, contributing to the development and refinement of plasma processing technologies.

Conclusion

Minoru Yamada's innovative contributions to plasma processing technology have established him as a key figure in the field. His patent for a plasma processing apparatus demonstrates his commitment to enhancing the performance and reliability of plasma processing systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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