Minoru Toriumi

Title: Minoru Toriumi: Innovator in Pattern Forming Technologies

Introduction

Minoru Toriumi is a notable inventor based in Hachiohji, Japan. He has made significant contributions to the field of pattern forming methods and projection exposure tools. With a total of 3 patents to his name, Toriumi's work has advanced the capabilities of fine pattern formation in various applications.

Latest Patents

One of Toriumi's latest patents is a pattern forming method that includes preparing second grating stripes near a reticle with a mask pattern to be projected. This method involves modulating the mask pattern through light emission and demodulating it using first grating stripes formed within a photosensitive film. This innovative approach allows for the formation of fine patterns smaller than the resolution limit of conventional projection exposure tools. Another significant patent focuses on forming a thin film pattern, where a seed material film is created on a substrate and exposed using electron beam lithography. The process results in a pattern formed by depositing an oriented material on the substrate, utilizing different hydrophilicity properties.

Career Highlights

Throughout his career, Minoru Toriumi has worked with prominent companies such as Hitachi, Ltd. and Hitachi Chemical Company, Ltd. His experience in these organizations has contributed to his expertise in the field of pattern forming technologies.

Collaborations

Toriumi has collaborated with notable colleagues, including Shinji Okazaki and Hiroshi Shiraishi. These partnerships have likely enriched his work and led to further advancements in his inventions.

Conclusion

Minoru Toriumi's innovative contributions to pattern forming methods and projection exposure tools have established him as a key figure in his field. His patents reflect a commitment to advancing technology and improving the precision of pattern formation.