Chiba, Japan

Minoru Iijima


Average Co-Inventor Count = 3.2

ph-index = 1

Forward Citations = 22(Granted Patents)


Location History:

  • Ichihara, JP (2002)
  • Chiba, JP (2004 - 2014)

Company Filing History:


Years Active: 2002-2014

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6 patents (USPTO):Explore Patents

Title: Minoru Iijima: Innovator in Semiconductor Lithography

Introduction

Minoru Iijima is a prominent inventor based in Chiba, Japan. He has made significant contributions to the field of semiconductor lithography, holding a total of six patents. His work focuses on developing advanced materials and processes that enhance lithography techniques.

Latest Patents

Iijima's latest patents include a copolymer for positive type lithography, a polymerization initiator used in the production of said copolymer, and a composition for semiconductor lithography. One of his notable inventions is a radical polymerization initiator represented by a specific formula, which includes hydrocarbon groups and acid-dissociating groups. Additionally, he has developed a copolymer that features recurring units with alkali-soluble groups protected by acid-dissociating groups, which significantly improves lithography properties such as dissolution contrast.

Career Highlights

Minoru Iijima is currently employed at Maruzen Petrochemical Company, Limited, where he continues to innovate in the field of polymer chemistry and lithography. His expertise has positioned him as a key figure in advancing semiconductor technologies.

Collaborations

Iijima has collaborated with notable colleagues, including Toshifumi Takemori and Masashi Iida, contributing to various projects that push the boundaries of semiconductor lithography.

Conclusion

Minoru Iijima's work in semiconductor lithography and his innovative patents have made a lasting impact on the industry. His contributions continue to shape the future of lithography technologies.

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