The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 2011
Filed:
May. 04, 2007
Minoru Iijima, Chiba, JP;
Takanori Yamagishi, Chiba, JP;
Minoru Iijima, Chiba, JP;
Takanori Yamagishi, Chiba, JP;
Maruzen Petrochemical Co., Ltd., Tokyo, JP;
Abstract
A copolymer for positive type lithography, having at least a recurring unit (A) having a structure wherein an alkali-soluble group is protected by an acid-dissociating, dissolution-suppressing group, represented by the following formula (A) [in the formula (A), Ris a hydrogen atom or a hydrocarbon group which may be substituted by fluorine atom; Ris a crosslinked, alicyclic hydrocarbon group; n is an integer of 0 or 1; and Ris an acid-dissociating, dissolution-suppressing group], and a terminal structure (B) having a structure wherein an alkali-soluble group is protected by an acid-dissociating, dissolution-suppressing group, represented by the following formula (B) [in the formula (B), Ris a hydrocarbon group which may contain nitrogen atom; Ris an acid-dissociating, dissolution-suppressing group; and p is a site of bonding with copolymer main chain]. The copolymer is used in chemically amplified positive type lithography and is superior in lithography properties (e.g. dissolution contrast).