Company Filing History:
Years Active: 2007
Title: Minori Kajimoto: Innovator in Plasma Processing Technology
Introduction
Minori Kajimoto is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of plasma processing technology, particularly in the etching of high aspect ratio features. His innovative methods have the potential to enhance various applications in semiconductor manufacturing.
Latest Patents
Kajimoto holds a patent for a "Method of etching high aspect ratio features." This patent describes a plasma processing system and method that utilizes an improved etch chemistry for effectively etching high aspect ratio silicon features. The process chemistry employs precursor gases suitable for producing a fluorine/chlorine etch chemistry, as well as precursor gases that form strong chemical bonds to create stable feature side-walls. The improved process chemistries include SO/SF/SiCl, SO/SF/Cl, SO/SiF/SiCl, SOSIF/Cl, O/F/Cl, N2/Cl, and NO/F/Cl-based chemistries. This innovation is crucial for advancing the capabilities of semiconductor fabrication.
Career Highlights
Minori Kajimoto is currently associated with Tokyo Electron Limited, a leading company in the semiconductor industry. His work focuses on developing advanced technologies that improve manufacturing processes. His expertise in plasma processing has positioned him as a key player in the field.
Collaborations
Kajimoto has collaborated with notable colleagues, including Aelan Mosden and Sandra L. Hyland. These collaborations have fostered an environment of innovation and have contributed to the advancement of technologies in their respective fields.
Conclusion
Minori Kajimoto's contributions to plasma processing technology exemplify the impact of innovative thinking in the semiconductor industry. His patent for etching high aspect ratio features showcases his commitment to advancing manufacturing processes. His work continues to influence the future of semiconductor technology.