Suwon, South Korea

Minjae Na

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Minjae Na. Retrieved from https://idiyas.com/inventor/minjae-na

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Minjae Na: Innovator in Plasma Technology

Introduction

Minjae Na is a prominent inventor based in Suwon-si, South Korea. He has made significant contributions to the field of plasma technology, particularly through his innovative patent.

Latest Patents

Minjae Na holds a patent for "Plasma equipment and methods of using the same." This invention includes plasma equipment that features a chamber where a plasma reaction occurs. It also incorporates a detector that outputs a spectrum signal in response to light generated from the plasma reaction. Additionally, a plasma monitoring module is included to determine whether the spectrum signal contains an arcing signal or a hunting signal. Related methods are also provided, showcasing the versatility and application of his invention.

Career Highlights

Minjae Na is currently employed at Samsung Electronics Co., Ltd., a leading global technology company. His work at Samsung has allowed him to be at the forefront of technological advancements in plasma equipment.

Collaborations

He collaborates with talented coworkers, including Hyun Su Jun and YongKyu Kim, who contribute to the innovative environment at Samsung Electronics.

Conclusion

Minjae Na's contributions to plasma technology through his patent and work at Samsung Electronics highlight his role as an influential inventor in the field. His innovative spirit continues to drive advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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